| Flip-Chips: Some History,
a Tutorial and a Few New Perspectives |
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By
By Prof. C.P. Wong
Contributing Editor
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What is flip-chip (FC) interconnect technology?
Generally speaking, we can define it as the active side of the silicon
device facing the substrate, interconnected by solder joints, TAB,
stud bond, isotropic/ anisotropic conductive adhesives or just adhesives
(in paste or film form) between the IC and substrate.
Based on this definition, the first flip-chip
technology was practiced in the 1950s by Bell Labs at Western Electric's
manufacturing plants (then AT&T, now Lucent Technologies).
Bell Labs called its peripheral flip-chip interconnect
structures "beam leads," which were formed on a wafer-form, batch
process.
These beam-leaded devices were gang-bonded by
thermocompression to a ceramic hybrid integrated circuit (HIC) for
telephone circuit packs that were used in most telephone central
office switching systems. (Today HICs route Internet services.)
RTV silicone elastomers have been employed to
underfill these small beam-leaded devices for corrosion protection
for many years. Billions of these devices have been made in the
past four decades. Their reliability is unquestioned by most of
the telephone companies using them.
However, Totta and Miller developed important
area-array, flip-chip technology at IBM in the early 1960s. They
used copper and high lead (95/5 Pb/Sn) solder balls for their flip-chip
interconnection method, which is known as C4 (controlled collapse
chip connection).
These flip-chip devices are mounted on an expansive
ceramic substrate, where TCE mismatch is less critical than in the
Bell Labs' work.
The reliability of these flip-chip devices is
superior to beam lead, due to their under-bump metallization (UBM)
and improved thermo-mechanical attributes. In the mid-1980s, Hitachi
reported that the ceramic flip-chip module's fatigue lifecycle can
be further enhanced by underfilling the ceramic flip-chip structure
with epoxy adhesive.
Due to the high cost of the ceramic substrate,
however, this technology was not widely practiced until the late
1980s, when it was implemented by Tsukada of IBM's Yasu Lab in Japan.
Tsukada reported the successful implementation of flip-chip on FR-4.
His work was the first to demonstrate the manufacture of a high
performance, flip-chip device on a low-cost PWB substrate.
Epoxy underfills with TCEs that match the solder
joints' expansiveness are the key to enhancing the cycle fatigue
life performance. The epoxy underfill couples the silicon IC and
the organic substrate and reduces the TCE mismatch between the flip-chip
IC (TCE2.5ppm) to the organic board (TCE18 ppm).
As a result, the shear stress is evenly distributed
to all solder joints, rather than being concentrated on the outer
and farther joints.
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| Figure
1. The
conventional underfill process |
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| Figure
2. The
no-flow underfill process |
There are two types of flip-chip technologies
now employed. First is the conventional (capillary) type (Figure
1). Second is the no-flow (compressive flow) type, which was first
demonstrated and reported on by Georgia Tech's Packaging Research
Center (Figure 2). The no-flow type can result in tremendous cost
savings.
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Dr. Wong is a Regents professor of materials
science and engineering, a member of NAE, and a research director
of the NSF-ERC Packaging Research Center at the Georgia Institute
of Technology. Contact him at cp.wong@mse.gatech.edu.
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